Wafer-Scale Performance Mapping of Magnetron-Sputtered Ternary Vanadium Tungsten Nitride for Microsupercapacitors - Collège de France Accéder directement au contenu
Article Dans Une Revue Chemistry of Materials Année : 2023

Wafer-Scale Performance Mapping of Magnetron-Sputtered Ternary Vanadium Tungsten Nitride for Microsupercapacitors

Résumé

To power Internet of Things applications, new materials are currently being investigated as efficient electrodes for micro-supercapacitor. In the recent years, multicationic materials were demonstrated to be an attractive new class of materials for electrodes. In this study, we deposited vanadium tungsten nitride by co-sputtering. Our film shows excellent electrochemical performance, a capacitance of 700 F.cm-3 and no loss in capacitance retention after 5 000 cycles. In addition, the properties of the film were investigated in many aspects using advanced characterization techniques and mapping techniques. Our approach opens new perspectives and provides a powerful characterization tool for electrochemical materials.
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hal-04241602 , version 1 (13-10-2023)

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Khac Huy Dinh, Kevin Robert, Joelle Thuriot-Roukos, Marielle Huvé, Pardis Simon, et al.. Wafer-Scale Performance Mapping of Magnetron-Sputtered Ternary Vanadium Tungsten Nitride for Microsupercapacitors. Chemistry of Materials, 2023, ⟨10.1021/acs.chemmater.3c01803⟩. ⟨hal-04241602⟩
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