Wafer-Scale Performance Mapping of Magnetron-Sputtered Ternary Vanadium Tungsten Nitride for Microsupercapacitors
Résumé
To power Internet of Things applications, new materials are currently being investigated as efficient electrodes for micro-supercapacitor. In the recent years, multicationic materials were demonstrated to be an attractive new class of materials for electrodes. In this study, we deposited vanadium tungsten nitride by co-sputtering. Our film shows excellent electrochemical performance, a capacitance of 700 F.cm-3 and no loss in capacitance retention after 5 000 cycles. In addition, the properties of the film were investigated in many aspects using advanced characterization techniques and mapping techniques. Our approach opens new perspectives and provides a powerful characterization tool for electrochemical materials.
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ChemMat 2023 non-highlight-text-VF-revised_01 oct.pdf (1.09 Mo)
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